发明名称 |
PROCESS AND SYSTEM FOR DESIGNING A PHOTOLITHOGRAPHY MASK AND A LIGHT SOURCE |
摘要 |
A method for designing a photolithography mask and a light source may include designing an initial photolithography mask and an initial light source using an initial target pattern corresponding to a desired target pattern in a resist layer. The method may also include designing a new target pattern and designing a new photolithography mask and/or a new light source using the new target pattern.
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申请公布号 |
US2013164658(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
US201213727172 |
申请日期 |
2012.12.26 |
申请人 |
STMICROELECTRONICS (CROLLES 2) SAS;STMICROELECTRONICS (CROLLES 2) SAS |
发明人 |
ALLEAUME CLOVIS |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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