| 摘要 |
The present invention relates to a method for manufacturing a nanoimprint lithography mold. The method comprises an initial step of depositing, on a mechanical support, a layer of a phase-changing material having a volume variation of at least 2% between a crystalline phase and an amorphous phase. The method is characterized in that it also comprises a step of personalization of the mold, achieved by making the layer of phase-changing material transition locally from its crystalline phase to its amorphous phase in order to form relief patterns therein. The invention comprises such a mold as well as a method for modifying such a mold.
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