| 发明名称 |
MONOMER, POLYMER, AND PHOTORESIST COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide monomers, polymers, and photoresist compositions which allow for application in forming photolithography pattern by negative tone development; and to provide a coated base material. <P>SOLUTION: This invention relates to: monomers of the following general formula (I); and polymers containing a polymerization unit of the monomers, wherein R<SB POS="POST">1</SB>is hydrogen or methyl. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013127052(A) |
申请公布日期 |
2013.06.27 |
| 申请号 |
JP20120243367 |
申请日期 |
2012.11.05 |
| 申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
SUN JIBIN;BAE YOUNG CHEOL;PARK JONG KEUN;LEE SEUNG HYUN;ANDES CECILY |
| 分类号 |
C08F20/28;C07C69/54;G03F7/038;G03F7/039 |
主分类号 |
C08F20/28 |
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