发明名称 |
POLYCRYSTALLINE SILICON SOLAR CELL PANEL AND MANUFACTURING METHOD THEREOF |
摘要 |
An inexpensive polycrystalline silicon solar cell panel is provided by forming a polycrystalline silicon film in which pn junctions are formed by using fewer processes and in less time. Specifically, there is provided a manufacturing method for a polycrystalline silicon solar cell panel including: a process of forming an amorphous silicon film on a substrate surface using a vapor deposition method that uses an n-type or p-type doped vapor deposition material formed of silicon; a process of plasma-doping a surface layer of the amorphous silicon film with a p-type or n-type dopant; and a process of melting the amorphous silicon film by scanning the plasma-doped amorphous silicon film with plasma and performing re-crystallization.
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申请公布号 |
US2013160849(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
US201213719420 |
申请日期 |
2012.12.19 |
申请人 |
PANASONIC CORPORATION;PANASONIC CORPORATION |
发明人 |
YAMANISHI HITOSHI;NAKAYAMA ICHIRO;OKUMURA TOMOHIRO |
分类号 |
H01L31/0368;H01L31/20 |
主分类号 |
H01L31/0368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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