发明名称 POLYCRYSTALLINE SILICON SOLAR CELL PANEL AND MANUFACTURING METHOD THEREOF
摘要 An inexpensive polycrystalline silicon solar cell panel is provided by forming a polycrystalline silicon film in which pn junctions are formed by using fewer processes and in less time. Specifically, there is provided a manufacturing method for a polycrystalline silicon solar cell panel including: a process of forming an amorphous silicon film on a substrate surface using a vapor deposition method that uses an n-type or p-type doped vapor deposition material formed of silicon; a process of plasma-doping a surface layer of the amorphous silicon film with a p-type or n-type dopant; and a process of melting the amorphous silicon film by scanning the plasma-doped amorphous silicon film with plasma and performing re-crystallization.
申请公布号 US2013160849(A1) 申请公布日期 2013.06.27
申请号 US201213719420 申请日期 2012.12.19
申请人 PANASONIC CORPORATION;PANASONIC CORPORATION 发明人 YAMANISHI HITOSHI;NAKAYAMA ICHIRO;OKUMURA TOMOHIRO
分类号 H01L31/0368;H01L31/20 主分类号 H01L31/0368
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