发明名称 |
INTERNALLY REFORMED SUBSTRATE FOR EPITAXIAL GROWTH, INTERNALLY REFORMED SUBSTRATE WITH MULTILAYER FILM, SEMICONDUCTOR DEVICE, BULK SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHODS THEREFOR |
摘要 |
Provided are an internally reformed substrate for epitaxial growth having an arbitrary warpage shape and/or an arbitrary warpage amount, an internally reformed substrate with a multilayer film using the internally reformed substrate for epitaxial growth, a semiconductor device, a bulk semiconductor substrate, and manufacturing methods therefor. The internally reformed substrate for epitaxial growth includes: a single crystal substrate; and a heat-denatured layer formed in an internal portion of the single crystal substrate by laser irradiation to the single crystal substrate. |
申请公布号 |
US2013161794(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
US201113582550 |
申请日期 |
2011.03.04 |
申请人 |
AIDA HIDEO;AOTA NATSUKO;HOSHINO HITOSHI;FURUTA KENJI;HAMAMOTO TOMOSABURO;HONJO KEIJI;DISCO CORPORATION;NAMIKI SEIMITSU HOUSEKI KABUSHIKI KAISHA |
发明人 |
AIDA HIDEO;AOTA NATSUKO;HOSHINO HITOSHI;FURUTA KENJI;HAMAMOTO TOMOSABURO;HONJO KEIJI |
分类号 |
H01L21/02;H01L29/06;H01L29/20 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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