发明名称 EPITAXIAL SUBSTRATE AND METHOD FOR THE SAME
摘要 PURPOSE: An epitaxial substrate and a method of fabricating the same are provided to include a pattern on an epitaxial layer, thereby preventing misfit dislocations in the epitaxial layer, which is caused by the difference between a dopant and the epitaxial layer in a lattice constant and thermal expansion coefficient. CONSTITUTION: An epitaxial substrate comprises a base substrate(100) and an epitaxial layer(200). The epitaxial layer is disposed on the base layer and formed by an epitaxial growth. The epitaxial layer includes a pattern(300) which exposes the top surface of the base substrate. The base substrate and the epitaxial layer include silicon carbide.
申请公布号 KR20130070454(A) 申请公布日期 2013.06.27
申请号 KR20110137789 申请日期 2011.12.19
申请人 LG INNOTEK CO., LTD. 发明人 JO, YEONG DEUK
分类号 H01L21/20 主分类号 H01L21/20
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