发明名称 Lithographic Apparatus With a Deformation Sensor
摘要 Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.
申请公布号 US2013162963(A1) 申请公布日期 2013.06.27
申请号 US201213720369 申请日期 2012.12.19
申请人 ASML NETHERLANDS B.V.;ASML NETHERLANDS B.V. 发明人 SPRUIT JOHANNES HENDRIKUS MARIA;BEERENS RUUD ANTONIUS CATHARINA;VAN LIESHOUT RICHARD HENRICUS ADRIANUS;DAN CRISTIAN
分类号 G03B27/52 主分类号 G03B27/52
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