发明名称 |
Lithographic Apparatus With a Deformation Sensor |
摘要 |
Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.
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申请公布号 |
US2013162963(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
US201213720369 |
申请日期 |
2012.12.19 |
申请人 |
ASML NETHERLANDS B.V.;ASML NETHERLANDS B.V. |
发明人 |
SPRUIT JOHANNES HENDRIKUS MARIA;BEERENS RUUD ANTONIUS CATHARINA;VAN LIESHOUT RICHARD HENRICUS ADRIANUS;DAN CRISTIAN |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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