发明名称 |
METHODS AND APPARATUS FOR CLEANING SUBSTRATE SURFACES WITH ATOMIC HYDROGEN |
摘要 |
Methods and apparatus for cleaning substrate surfaces are provided herein. In some embodiments, a method of cleaning a surface of a substrate may include providing a hydrogen containing gas to a first chamber having a plurality of filaments disposed therein; flowing a current through the plurality of filaments to raise a temperature of the plurality of filaments to a process temperature sufficient to decompose at least some of the hydrogen containing gas; and cleaning the surface of the substrate by exposing the substrate to hydrogen atoms formed from the decomposed hydrogen containing gas for a period of time. |
申请公布号 |
US2013160794(A1) |
申请公布日期 |
2013.06.27 |
申请号 |
US201213723409 |
申请日期 |
2012.12.21 |
申请人 |
APPLIED MATERIALS, INC.;APPLIED MATERIALS, INC. |
发明人 |
GRIFFITH CRUZ JOE;PARK JEONGWON;NARWANKAR PRAVIN K.;NGUYEN NATE SI;NGUYEN HANH;CHAN TO;XU JINGJING |
分类号 |
B08B7/00;H01L21/02 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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