发明名称 SUPPORT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
摘要 A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
申请公布号 NL2009874(A) 申请公布日期 2013.06.26
申请号 NL20122009874 申请日期 2012.11.23
申请人 ASML NETHERLANDS B.V. 发明人 CADEE THEODORUS PETRUS MARIA;ZAAL KOEN;SINGH HARMEET
分类号 G03F7/20;H01L21/68 主分类号 G03F7/20
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