发明名称 BASE PLATE OF HEAT-TREATMENT APPARATUS FOR ANNEALING
摘要 PURPOSE: A base plate of a heat treatment apparatus for annealing is provided to prevent the generation of cracks by installing a second base plate even through a coil is repeatedly annealed, thereby extending the life of the apparatus. CONSTITUTION: A base plate(1) of a heat treatment apparatus for annealing comprises a first base plate(100) and a second base plate(200). The bottom of the second base plate is divided into a mounting section(210a) and a sealing section(210b). The first base plate is mounted on the mounting section. The sealing section between the base plate and the side wall is filled with sand. The thickness of the sealing section is thicker than the thickness of the mounting section.
申请公布号 KR20130068271(A) 申请公布日期 2013.06.26
申请号 KR20110135264 申请日期 2011.12.15
申请人 POSCO 发明人 LEE, SANG WON;KO, SEONG HYUN;KIM, HYUNG JIN
分类号 C21D8/12 主分类号 C21D8/12
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