| 摘要 |
PURPOSE: A substrate processing apparatus, a substrate processing medium and a computer-readable storage medium are provided to prevent liquid chemical from being attached to a first and a second liquid chemical nozzle, by locating the first and the second liquid chemical nozzle at a first and a second standby position when the liquid chemical is not discharged. CONSTITUTION: A substrate holding unit holds a wafer (W) horizontally. A rotation driving unit rotates the substrate holding unit. A first liquid chemical nozzle (73) discharges first liquid chemical toward an edge part of the wafer. A second liquid chemical nozzle (83) discharges second liquid chemical toward the edge part of the wafer. A first nozzle driving unit and a second nozzle driving unit move the first and the second liquid chemical nozzle. |
