SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

摘要

PURPOSE: A semiconductor device and a manufacturing method thereof are provided to prevent damage to a pillar pattern in an etching back process by forming a protective film between the pillar patterns. CONSTITUTION: A pillar pattern(140) is formed on a semiconductor substrate(100) in zigzag. A first hole is formed between the pillar patterns. A protective film(180) is formed on the sidewall of the first hole. A second hole is formed by etching a part of the first hole. A bit line(190) is formed on the second hole. An OSC(One Side Contact)(200) is formed by implanting ions into the pillar pattern.