| 发明名称 |
POLISHING PAD FOR A POLISHING SYSTEM |
| 摘要 |
<p>A polishing pad of a polishing system is mountable to a polishing plate and has a predetermined channel pattern so as to allow a polishing liquid supplied from a polishing liquid supplier to move on a polishing surface. The channel pattern has at least two kinds of patterns.</p> |
| 申请公布号 |
EP2607019(A2) |
申请公布日期 |
2013.06.26 |
| 申请号 |
EP20110818418 |
申请日期 |
2011.08.18 |
| 申请人 |
LG CHEM, LTD. |
发明人 |
MIN, KYOUNG-HOON;IM, YE-HOON;LEE, DAE-YEON;SONG, JAE-IK;PARK, SU-CHAN |
| 分类号 |
B24D11/00;B24B7/00;B24D7/00 |
主分类号 |
B24D11/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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