发明名称 FILM FORMING APPARATUS AND FILM FORMING METHOD
摘要 PURPOSE: A film forming apparatus and a film forming method are provided to suppress heat reaction among a plural kind of gases mixed on the surface or around a shower plate. CONSTITUTION: A shower plate (124) has a plate shape with a predetermined thickness. The shower plate has a plurality of gas flow paths (121) and a plurality of gas vents (129). The plurality of gas flow paths is connected to a gas pipe (131) which supplies a plural kind of gases. The plurality of gas vents supplies a gas to a substrate (101) in a chamber (103). A gas outlet (125) is connected to an exhaust device (128) comprising a regulating valve (126) and a vacuum pump (127). [Reference numerals] (AA) P-1 region; (BB) P-2 region
申请公布号 KR20130069448(A) 申请公布日期 2013.06.26
申请号 KR20120145299 申请日期 2012.12.13
申请人 NUFLARE TECHNOLOGY INC.;CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY;DENSO CORPORATION;TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 SUZUKI KUNIHIKO;SATO YUUSUKE;ITO HIDEKI;TSUCHIDA HIDEKAZU;KAMATA ISAHO;ITO MASAHIKO;NAITO MASAMI;FUJIBAYASHI HIROAKI;ADACHI AYUMU;NISHIKAWA KOICHI
分类号 H01L21/205 主分类号 H01L21/205
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