发明名称 Three-dimensional stacked structure semiconductor device having through-silicon via and signaling method for the semiconductor device
摘要 A three-dimensional (3D) semiconductor device including a plurality of stacked layers and a through-silicon via (TSV) electrically connecting the plurality of layers, in which in signal transmission among the plurality of layers, the TSV transmits a signal that swings in a range from an offset voltage that is higher than a ground voltage to a power voltage, thereby minimizing an influence of a metal-oxide-semiconductor (MOS) capacitance of TSV.
申请公布号 US8471362(B2) 申请公布日期 2013.06.25
申请号 US201113080042 申请日期 2011.04.05
申请人 LEE JONG-JOO;SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE JONG-JOO
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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