MANUFACTURING METHOD FOR FOCUS RING OF DRY ETCHING DEVICE

摘要

PURPOSE: A method for manufacturing a focus ring of a dry etching device is provided to form SiC focus rings in one deposition process and to increase the number of SiC rings at a time. CONSTITUTION: A cylindrical graphite ingot(10) is prepared. A SiC layer(20) is formed in the front surface of the graphite ingot. The SiC layer and the graphite ingot are cut down. The graphite ingot is removed. Several SiC rings are obtained.