发明名称 |
Reflective extreme ultraviolet mask |
摘要 |
According to example embodiments, a reflective EUV mask may include a mask substrate, a patterned structure and a non-patterned structure on the mask substrate. At least one of the patterned structure and the non-patterned structure may include a thermally treated region configured to reduce a reflectivity of the respective patterned and non-patterned structure.
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申请公布号 |
US8470500(B2) |
申请公布日期 |
2013.06.25 |
申请号 |
US201113069758 |
申请日期 |
2011.03.23 |
申请人 |
LEE DONG-GUN;KIM SEONG-SUE;KIM TAE-GEUN;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE DONG-GUN;KIM SEONG-SUE;KIM TAE-GEUN |
分类号 |
G03F1/24 |
主分类号 |
G03F1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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