摘要 |
A laminate structure and method of manufacture, such as a processed silicon wafer with an overlying layer or cover, includes a first layer or substrate which has a generally-planar region and a peripheral contoured region with falloff from a planar region of the first layer, and a second layer which overlies the first layer and is spaced from the planar region of the first layer a uniform distance by a plurality of uniform spacers, and peripheral spacers located in the peripheral contoured region which extend from the first layer to the second layer to maintain the second layer in the same plane as it extends over the falloff of the peripheral contoured region of the first layer to increase the useable area of the laminate structure. Spherical, deformable and fixed dimension spacers are used.
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