发明名称 Substrate reworking by liquid drop ejection means
摘要 A substrate reworking system (1) improves rework tact time and eliminates unnecessary reworking to perform efficient reworking. The system (1) includes: a defect information acquisition unit (2) for acquiring defect information for an entire region on the target substrate (9); a reworking unit (3) having at least one liquid drop discharge unit (6) for dispensing a liquid drop to a defective part on the target substrate (9) based on the defect information acquired by the defect information acquisition unit (2); and a rework determining unit (4) for determining, for each target substrate (9) and based on the defect information acquired by the defect information acquisition unit (2), whether the reworking unit (3) needs to perform reworking.
申请公布号 US8473086(B2) 申请公布日期 2013.06.25
申请号 US20070311708 申请日期 2007.10.12
申请人 NAKAJIMA YOSHINORI;TAMURA TOSHIHIRO;SHARP KABUSHIKI KAISHA 发明人 NAKAJIMA YOSHINORI;TAMURA TOSHIHIRO
分类号 G06F19/00;G02B5/20;G02F1/13;G09F9/00;H01L51/50;H05B33/12 主分类号 G06F19/00
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