发明名称 Nonvolatile memory element having a resistance variable layer and manufacturing method thereof
摘要 A nonvolatile memory element includes a substrate; a lower electrode layer and a resistive layer sequentially formed on the substrate; a resistance variable layer formed on the resistive layer; a wire layer formed above the lower electrode layer; an interlayer insulating layer disposed between the substrate and the wire layer and covering at least the lower electrode layer and the resistive layer, the interlayer insulating layer being provided with a contact hole extending from the wire layer to the resistance variable layer; and an upper electrode layer formed inside the contact hole such that the upper electrode layer is connected to the resistance variable layer and to the wire layer; resistance values of the resistance variable layer changing reversibly in response to electric pulses applied between the lower electrode layer and the upper electrode layer.
申请公布号 US8471235(B2) 申请公布日期 2013.06.25
申请号 US200913132822 申请日期 2009.12.04
申请人 KAWASHIMA YOSHIO;MIKAWA TAKUMI;WEI ZHIQIANG;HIMENO ATSUSHI;PANASONIC CORPORATION 发明人 KAWASHIMA YOSHIO;MIKAWA TAKUMI;WEI ZHIQIANG;HIMENO ATSUSHI
分类号 H01L29/02 主分类号 H01L29/02
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