发明名称 |
Nonvolatile memory element having a resistance variable layer and manufacturing method thereof |
摘要 |
A nonvolatile memory element includes a substrate; a lower electrode layer and a resistive layer sequentially formed on the substrate; a resistance variable layer formed on the resistive layer; a wire layer formed above the lower electrode layer; an interlayer insulating layer disposed between the substrate and the wire layer and covering at least the lower electrode layer and the resistive layer, the interlayer insulating layer being provided with a contact hole extending from the wire layer to the resistance variable layer; and an upper electrode layer formed inside the contact hole such that the upper electrode layer is connected to the resistance variable layer and to the wire layer; resistance values of the resistance variable layer changing reversibly in response to electric pulses applied between the lower electrode layer and the upper electrode layer.
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申请公布号 |
US8471235(B2) |
申请公布日期 |
2013.06.25 |
申请号 |
US200913132822 |
申请日期 |
2009.12.04 |
申请人 |
KAWASHIMA YOSHIO;MIKAWA TAKUMI;WEI ZHIQIANG;HIMENO ATSUSHI;PANASONIC CORPORATION |
发明人 |
KAWASHIMA YOSHIO;MIKAWA TAKUMI;WEI ZHIQIANG;HIMENO ATSUSHI |
分类号 |
H01L29/02 |
主分类号 |
H01L29/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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