发明名称 |
Substrate treatment method, computer storage medium and substrate treatment apparatus |
摘要 |
The present disclosure is a substrate treatment method of supplying a surface treatment liquid onto a surface of a substrate having a film with high water repellency formed thereon, the method including: a liquid puddle forming step of forming a liquid puddle of the surface treatment liquid by supplying the surface treatment liquid from a nozzle to one location of a peripheral portion of the substrate; and a liquid puddle moving step of then moving the liquid puddle formed at the peripheral portion of the substrate to a central portion of the substrate by moving the nozzle from a position above the peripheral portion of the substrate to a position above the central portion of the substrate while continuing the supply of the surface treatment liquid.
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申请公布号 |
US8469614(B2) |
申请公布日期 |
2013.06.25 |
申请号 |
US201113280409 |
申请日期 |
2011.10.25 |
申请人 |
TAKEGUCHI HIROFUMI;YOSHIDA YUICHI;TOKYO ELECTRON LIMITED |
发明人 |
TAKEGUCHI HIROFUMI;YOSHIDA YUICHI |
分类号 |
G03D5/00 |
主分类号 |
G03D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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