| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint device advantageous for improving overlaying accuracy during imprint processing. <P>SOLUTION: An imprint device 1 comprises: a drive mechanism 13 for pressing a pattern section 8a formed on a mold 8 to an uncured resin 15; a mold heating mechanism 6 for heating the mold 8 and providing a temperature distribution to the mold 8 to deform the pattern section 8a; temperature measuring sections 23 and 24 for measuring temperatures of the mold and the substrate 11; and a control section 7 for instructing the mold heating mechanism 6 to deform a shape of the pattern section 8a so as to approach a shape of a pattern on a substrate side previously existing in a pattern formation region on the substrate 11 on which the pattern is to be formed, from when the provision of the temperature distribution is stopped until the pattern section 8a is pressed to the uncured resin 15, and for referring to the temperatures of the mold 8 and the substrate 11 measured by the temperature measuring sections 23 and 24, and for, when a temperature difference between the mold 8 and the substrate 11 is not more than a tolerance, instructing the drive mechanism 13 to pressing the deformed pattern section 8a to the uncured resin 15. <P>COPYRIGHT: (C)2013,JPO&INPIT |
