发明名称 INERTIAL SENSOR AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: An inertia sensor is provided to utilize photo-resist utilized for forming a mass by etching as an impact-absorbing layer, thereby improving the shock resistance of the inertia sensor without additional processes. CONSTITUTION: An inertia sensor(100) comprises a membrane(110), a mass(120), a post(130), and a first impact-absorbing layer(140). The mass is arranged under the central portion(113) of the membrane. The post is arranged under edge portions(115) of the membrane. The first impact-absorbing layer is formed of photo-resist in the underside of the mass.
申请公布号 KR20130067327(A) 申请公布日期 2013.06.24
申请号 KR20110110904 申请日期 2011.10.28
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 KIM, JONG WOON;CHOI, MIN KYU;PARK, HEUNG WOO
分类号 G01C19/56;G01P15/02 主分类号 G01C19/56
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