发明名称 |
INERTIAL SENSOR AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PURPOSE: An inertia sensor is provided to utilize photo-resist utilized for forming a mass by etching as an impact-absorbing layer, thereby improving the shock resistance of the inertia sensor without additional processes. CONSTITUTION: An inertia sensor(100) comprises a membrane(110), a mass(120), a post(130), and a first impact-absorbing layer(140). The mass is arranged under the central portion(113) of the membrane. The post is arranged under edge portions(115) of the membrane. The first impact-absorbing layer is formed of photo-resist in the underside of the mass.
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申请公布号 |
KR20130067327(A) |
申请公布日期 |
2013.06.24 |
申请号 |
KR20110110904 |
申请日期 |
2011.10.28 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
KIM, JONG WOON;CHOI, MIN KYU;PARK, HEUNG WOO |
分类号 |
G01C19/56;G01P15/02 |
主分类号 |
G01C19/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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