发明名称 |
CHARGED PARTICLE BEAM DRAWING DEVICE, AND ARTICLE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique advantageous for reducing a scale of a circuit for correcting drawing data. <P>SOLUTION: A charged particle beam drawing device for drawing a substrate with a charged particle beam comprises: a division section for dividing drawing data for controlling drawing of the substrate into first drawing data for controlling drawing in a first region of the substrate and second drawing data for controlling drawing in a second region of the substrate; a first correction section for creating first correction drawing data by applying first correction to the first drawing data so that a target pattern is drawn in the first region; a second correction section for generating second correction drawing data by applying second correction different from the first correction to the second drawing data so that a target pattern is drawn in the second region; and a synthetic section for creating synthetic drawing data by synthesizing the first correction drawing data and the second correction drawing data. The substrate is drawn according to the synthetic drawing data. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013125800(A) |
申请公布日期 |
2013.06.24 |
申请号 |
JP20110272750 |
申请日期 |
2011.12.13 |
申请人 |
CANON INC |
发明人 |
MORITA TOMOYUKI;TSUCHIYA TAKESHI |
分类号 |
H01L21/027;H01J37/22;H01J37/305 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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