ELECTRON BEAM DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an electron beam device which arranges a plurality of electron beam columns in the same vacuum chamber and observes the same sample.

SOLUTION: An electron beam device includes: a plurality of electron beam columns arranged in a vacuum chamber; a stage on which a sample is placed and which has a transport mechanism for transporting the sample in a first direction and a second direction perpendicular to the first direction; and a plurality of imaging mechanisms for imaging scanning electron microscope images of the sample for the respective electron beam columns. The electron beam device acquires the scanning electron microscope images of the sample by the imaging mechanisms, calculates displacement amounts from centers of observation fields of the plurality of electron beam columns to previously set irradiation positions of the plurality of electron beams. The plurality of electron beam columns include position adjustment mechanisms which adjust the irradiation positions of the plurality of electron beams respectively emitted from the plurality of electron beam columns. The position adjustment mechanisms include transfer mechanisms which transfer the plurality of electron beam columns on the basis of the displacement amounts so that the centers of the observation fields of the plurality of electron beam columns and the irradiation positions of the plurality of electron beams correspond with each other.

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