发明名称 OXIDE SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an oxide semiconductor device having good characteristics and high reliability even when a flexible substrate is used. <P>SOLUTION: An oxide semiconductor device has: a gate electrode 2; a gate insulating layer 3 provided on the gate electrode 2; a channel part provided on the gate electrode 2 via the gate insulating layer 3; and source-drain electrodes 6 electrically connected with the channel part. The channel part includes an oxide semiconductor layer 5 and a conductive layer 4. At least one of the source-drain electrodes 6 is connected to the conductive layer 4 via the oxide semiconductor layer 5. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013125782(A) 申请公布日期 2013.06.24
申请号 JP20110272337 申请日期 2011.12.13
申请人 HITACHI LTD 发明人 UCHIYAMA HIROYUKI;KAWAMURA TETSUSHI;WAKANA HIRONORI;OZAKI HIROAKI;YAMAZOE TAKANORI
分类号 H01L29/786;G02F1/1368 主分类号 H01L29/786
代理机构 代理人
主权项
地址