发明名称 SONIC WAVE GENERATION DEVICE AND SONIC WAVE GENERATION DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To stabilize, in a sonic wave generation device, a resistance value of a heating element film with respect to a temperature change while improving reliability by suppressing oxidation of the heating element film. <P>SOLUTION: A sonic wave generation device 1 includes: a heat conductive substrate 10; a heat insulation layer 11 formed on a principal surface of a substrate 10; and a heating element film 12 formed on the heat insulation layer 11 and made of a conductive film electrically driven by flow of an electric current containing an AC component. The heating element film 12 is made of a metallic silicide, such as tungsten silicide. The heating element film 12 is formed by sputtering a mixture of tungsten and silicon or tungsten silicide and has a crystalline structure where tungsten atoms are coupled to each other through silicon atoms. A film thickness of the heating element film 12 is 300 nm or less. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013126241(A) 申请公布日期 2013.06.24
申请号 JP20110275946 申请日期 2011.12.16
申请人 DOSHISHA;TOKYO ELECTRON LTD 发明人 YOSHIKADO SHINZO;YODA YUSUKE;INOUE MASASHI;MATSUMOTO TOSHIYUKI
分类号 H04R23/00 主分类号 H04R23/00
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