发明名称 METHOD FOR GROWING SiC CRYSTAL
摘要 <P>PROBLEM TO BE SOLVED: To induce epitaxial growth of a SiC crystal on a sapphire substrate. <P>SOLUTION: A method for growing the SiC crystal comprises: a step of attaining a state in which the sapphire substrate contacts a solution via a carbon-containing film, wherein the solution is obtained by heating silicon and a metal to a temperature not higher than the melting point of silicon; a step of maintaining the state until the carbon-containing film partially disappears so that the sapphire substrate comes into direct contact with the solution at the disappearing part; and a step of cooling the solution after the carbon-containing film partially disappears. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013124214(A) 申请公布日期 2013.06.24
申请号 JP20110275588 申请日期 2011.12.16
申请人 TOYOTA INDUSTRIES CORP;NAGOYA UNIV 发明人 SHIBATA KENJI;ICHIKAWA SHINICHIRO;IMAOKA ISAO;UJIHARA TORU;HARADA SHUNTA;SEKI KAZUAKI
分类号 C30B29/36;C30B19/12 主分类号 C30B29/36
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