发明名称 |
METHOD FOR GROWING SiC CRYSTAL |
摘要 |
<P>PROBLEM TO BE SOLVED: To induce epitaxial growth of a SiC crystal on a sapphire substrate. <P>SOLUTION: A method for growing the SiC crystal comprises: a step of attaining a state in which the sapphire substrate contacts a solution via a carbon-containing film, wherein the solution is obtained by heating silicon and a metal to a temperature not higher than the melting point of silicon; a step of maintaining the state until the carbon-containing film partially disappears so that the sapphire substrate comes into direct contact with the solution at the disappearing part; and a step of cooling the solution after the carbon-containing film partially disappears. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013124214(A) |
申请公布日期 |
2013.06.24 |
申请号 |
JP20110275588 |
申请日期 |
2011.12.16 |
申请人 |
TOYOTA INDUSTRIES CORP;NAGOYA UNIV |
发明人 |
SHIBATA KENJI;ICHIKAWA SHINICHIRO;IMAOKA ISAO;UJIHARA TORU;HARADA SHUNTA;SEKI KAZUAKI |
分类号 |
C30B29/36;C30B19/12 |
主分类号 |
C30B29/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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