| 摘要 |
A mask blank for preparing an FPD device, and a photomask prepared by using the mask blank are provided to prevent the damage of a substrate due to the etchant for etching a metal silicide-based layer and to improve the dimensional precision of pattern. A mask blank(10) comprises a transparent substrate(12); a transparent layer(14) which is formed on the transparent substrate and is transparent to the light in the wavelength region of an i line to a g line; and a metal silicide-based layer which is a semitransparent or light nontransparent layer(16) formed on the transparent layer and is made of a metal silicide comprising a metal and silicon, wherein the metal silicide-based layer is patterned by wet etching, and the transparent layer has the etching selectivity with the metal silicide layer. |
