| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ion milling device which facilitates adjustment of a processing profile such as ion beam intensity or uniformity in processing. <P>SOLUTION: An ion milling device comprises: a filament 20 for emitting thermal electrons as an ion source; a plasma generating chamber 10 having the filament 20 for generating plasma; a plurality of magnets 13 disposed on a cylinder plane part 11 of the plasma generating chamber 10; a filament movement mechanism 25 for moving the filament 20 in a direction getting close to or away from the magnets 13; a processing chamber 40 for communicating with the plasma generating chamber 10; and an extraction electrode 30 for extracting an ion beam from the plasma generating chamber 10 to the processing chamber 40. <P>COPYRIGHT: (C)2013,JPO&INPIT |
