| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an etching liquid for a multi-layered film containing copper and molybdenum, and an etching method for a multi-layered film containing copper and molybdenum using the etching liquid. <P>SOLUTION: The etching liquid for a multi-layered film containing copper and molybdenum is prepared by blending (A) an organic acid ion supply source having two or more carboxyl groups and one or more hydroxyl groups in the molecule, (B) a maleic acid ion supply source, (C) a copper ion supply source, and (D) ammonia and/or an ammonium ion supply source, and has a pH value of 5 to 8. An etching method using the etching liquid is also provided. <P>COPYRIGHT: (C)2013,JPO&INPIT |
