发明名称 TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a transistor with a hot carrier restrained, and a manufacturing method thereof. <P>SOLUTION: A transistor in one embodiment of the present invention comprises: a source region 112; a drain region 113; plural trenches T11-T13 extending in a channel longitudinal direction and parallely arranged in a channel width direction between the source region 112 and the drain region 113; and a gate electrode 122 formed to cover the plural trenches T11-T13 between the source region 112 and the drain region 113. The first trench T12 included in the plural trenches has a corner bent in the channel width direction. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013125934(A) 申请公布日期 2013.06.24
申请号 JP20110275627 申请日期 2011.12.16
申请人 RENESAS ELECTRONICS CORP 发明人 KAWAGUCHI HIROSHI
分类号 H01L21/336;H01L21/76;H01L29/78 主分类号 H01L21/336
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