发明名称 LINEAR EVAPORATING SOURCE AND DEPOSITION APPARATUS COMPRISING THE SAME
摘要 PURPOSE: A linear injection part and a deposition device including the same are provided to improve the uniformity of a thin film by controlling uniformity in a setting level by an insertion cap. CONSTITUTION: A body has an opening part on one side. The body has one or more gas inlets and a diffusion space. An injection plate(120) is combined with the body. The injection plate has a plurality of injection parts. An insertion cap(130) controls the injection amount of the corresponding injection part.
申请公布号 KR20130067086(A) 申请公布日期 2013.06.21
申请号 KR20110133929 申请日期 2011.12.13
申请人 WONIK IPS CO., LTD. 发明人 KIM, GEON;KIM, JEONG HOON;KIM, YOUNG JUN
分类号 H01L21/203;C23C14/12;C23C14/24 主分类号 H01L21/203
代理机构 代理人
主权项
地址