发明名称 Guard Ring for Through Vias
摘要 A guard ring for a through via, and a method of manufacture thereof, is provided. The guard ring comprises one or more rings around a through via, wherein the rings may be, for example, circular, rectangular, octagon, elliptical, square, or the like. The guard ring may be formed from a contact through an inter-layer dielectric layer and interconnect structures (e.g., vias and lines) extending through the inter-metal dielectric layers. The guard ring may contact a well formed in the substrate.
申请公布号 US2013154048(A1) 申请公布日期 2013.06.20
申请号 US201113328715 申请日期 2011.12.16
申请人 LU CHIH-HUNG;LEE SONG-BOR;HAO CHING-CHEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LU CHIH-HUNG;LEE SONG-BOR;HAO CHING-CHEN
分类号 H01L29/06;H01L21/28 主分类号 H01L29/06
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