| 摘要 |
The invention relates to an optical arrangement for immersion lithography, more particularly a projection exposure apparatus, comprising: at least one component (1) which is at least partly wetted with water as immersion liquid (22) during the operation of the optical arrangement. The at least one component (1) has at least one layer (6) containing a material having a contact angle with the immersion liquid (22) that is adjustable optionally in a hydrophobic or hydrophilic manner. The material can be graphene or CO3O4 nanorod arrays, for example. The invention also relates to an optical element (1) which has at least one layer (6) composed of such a material and which can be used in an optical arrangement for immersion lithography. |
