发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR LIGHT-EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor light-emitting element having an electrode with low contact resistance and high reflectance. <P>SOLUTION: A method of manufacturing a semiconductor light-emitting element includes: a step of forming an Ag film on a semiconductor stack portion including a light-emitting layer and a nitride semiconductor; a first heat treatment step of performing heat treatment to the Ag film in an atmosphere containing nitride; and a second heat treatment step of performing heat treatment to the Ag film in an atmosphere containing oxygen after the first heat treatment step. The temperature of the heat treatment of the first heat treatment step is higher than the temperature of the heat treatment of the second heat treatment step. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013123034(A) 申请公布日期 2013.06.20
申请号 JP20120186163 申请日期 2012.08.27
申请人 TOSHIBA CORP 发明人
分类号 H01L33/40;H01L21/28;H01L33/32 主分类号 H01L33/40
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