发明名称 METHOD FOR CLEANING SUBSTRATE
摘要 A valve is closed while a cleaning liquid is fed into a tubular body of a cleaning nozzle, and a piezoelectric element applies vibrations to the cleaning liquid. This causes droplets of the cleaning liquid to be produced and discharged from a plurality of discharge holes. The droplet diameter of the discharged droplets is in the range from 15 to 200μm, and the distribution of the droplet diameter is such that the value of where a value of 3σdoes not exceed 10% of the average droplet diameter. The droplet speed is in the range from 20 to 100 meters per second, and the distribution of the droplet speed is such that the value of where a value of 3σdoes not exceed 10% of the average droplet speed. The droplet flow rate is not less than 10 milliliters per minute. Discharging the droplets of the cleaning liquid from the cleaning nozzle toward a substrate while satisfying these discharge conditions improves cleaning efficiency without damages to the substrate.
申请公布号 KR101277338(B1) 申请公布日期 2013.06.20
申请号 KR20127001709 申请日期 2009.07.17
申请人 发明人
分类号 H01L21/302 主分类号 H01L21/302
代理机构 代理人
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