| 摘要 |
A method, system, and computer program product for machine learning approach for detecting and correcting lithographic hot-spots in an integrated circuit (IC) design are provided in the illustrative embodiments. A layout corresponding to the IC design is received at a machine learning model (ML model). At the ML model using a hardware component, a set of input objects is identified corresponding to a target shape in the layout. A retargeting value is predicted for the target shape using the set of input objects, such that applying the retargeting value to the target shape in the layout causes the target shape to be modified into a modified target shape, wherein printing the modified target shape instead of the target shape eliminates a lithographic hot-spot that would otherwise occur from printing the target shape in a printed circuit corresponding to the IC design.
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