发明名称 |
ADJUSTABLE NOZZLE FOR PLASMA DEPOSITION AND A METHOD OF CONTROLLING THE ADJUSTABLE NOZZLE |
摘要 |
The description relates to an adjustable nozzle capable of pivoting about an axis of the nozzle and translating along the axis of the nozzle. A high density plasma chemical vapor deposition (HDP CVD) chamber houses a plurality of adjustable nozzles. A feedback control system includes a control unit coupled to the adjustable nozzle and the HDP CVD chamber to form a more uniform thickness profile of films deposited on a wafer in the HDP CVD chamber.
|
申请公布号 |
US2013156940(A1) |
申请公布日期 |
2013.06.20 |
申请号 |
US201113328474 |
申请日期 |
2011.12.16 |
申请人 |
WU WEI-CHING;LEE WEN-LONG;LIU DING-I;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
WU WEI-CHING;LEE WEN-LONG;LIU DING-I |
分类号 |
C23C16/52;C23C16/50 |
主分类号 |
C23C16/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|