发明名称 OPTICAL SYSTEM AND METHOD FOR INSPECTION OF PATTERNED SAMPLES
摘要 PURPOSE: An optical system for inspecting patterned samples and a method thereof are provided to optimize valid collecting zone/domain as blocking diffracted optical components from a periodic pattern of a sample effectively. CONSTITUTION: An illumination unit includes an illumination mask (42) located in a first spectrum plane about an inspection plane. The illumination mask includes a first predetermined discontinuous pattern. A light collection unit includes a collection mask (25) located in a second spectrum plane of the inspection plane which is a conjugate of the first spectrum plane. The collection mask includes a second predetermined pattern of separated light cut-off regions.
申请公布号 KR20130066505(A) 申请公布日期 2013.06.20
申请号 KR20120130919 申请日期 2012.11.19
申请人 APPLIED MATERIALS ISRAEL, LTD. 发明人 BERLATZKY YOAV;KOFLER IDO;MESHULACH DORON;BARKAN KOBI
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
主权项
地址