发明名称 |
OPTICAL SYSTEM AND METHOD FOR INSPECTION OF PATTERNED SAMPLES |
摘要 |
PURPOSE: An optical system for inspecting patterned samples and a method thereof are provided to optimize valid collecting zone/domain as blocking diffracted optical components from a periodic pattern of a sample effectively. CONSTITUTION: An illumination unit includes an illumination mask (42) located in a first spectrum plane about an inspection plane. The illumination mask includes a first predetermined discontinuous pattern. A light collection unit includes a collection mask (25) located in a second spectrum plane of the inspection plane which is a conjugate of the first spectrum plane. The collection mask includes a second predetermined pattern of separated light cut-off regions.
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申请公布号 |
KR20130066505(A) |
申请公布日期 |
2013.06.20 |
申请号 |
KR20120130919 |
申请日期 |
2012.11.19 |
申请人 |
APPLIED MATERIALS ISRAEL, LTD. |
发明人 |
BERLATZKY YOAV;KOFLER IDO;MESHULACH DORON;BARKAN KOBI |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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