发明名称 APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO OPTICAL ASSEMBLY DURING SUBSTRATE EXCHANGE IN IMMERSION LITHOGRAPHY MACHINE
摘要 <P>PROBLEM TO BE SOLVED: To provide an apparatus for keeping immersion fluid in a space between a projection optical system and one or more objects when a wafer table moves away from the projection optical system. <P>SOLUTION: An optical assembly 16 projects an image onto a substrate 208 supported near the optical assembly by a substrate table 204. An insertion member 226 can be inserted into a space between the optical assembly and the substrate, the substrate table, or both, and divides immersion liquid 212 into a first portion between the optical assembly and the insertion member and a second portion between the insertion member and the substrate, the substrate table, or both. The insertion member keeps contact with the first portion of the optical assembly when the substrate moves away from near the optical assembly. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013123079(A) 申请公布日期 2013.06.20
申请号 JP20130032858 申请日期 2013.02.22
申请人 NIKON CORP 发明人 POON ALEX KA TIM;LEONARD Y FANG COE;GAURAV KESWANI;DEREK COON
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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