| 摘要 |
An exposure apparatus for projecting an image of a pattern on a substrate and for exposing the substrate is disclosed. The exposure apparatus includes a mask stage and a projection optical system. The mask stage holds plural masks so that the plural masks do not contact with each other, and the projection optical system includes plural optical systems. Each of the optical systems projects an image of a pattern of one mask among the plural masks onto an exposure area of the substrate. The apparatus exposes the substrate so that each exposure area of the substrate exposed by each optical system partly overlaps with each other.
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