发明名称 |
PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND |
摘要 |
A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer adapted to form a lactone ring under the action of an acid so that the polymer may reduce its solubility in an organic solvent developer, an acid generator, and an organic solvent displays a high dissolution contrast between the unexposed region of promoted dissolution and the exposed region of inhibited dissolution.
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申请公布号 |
US2013157194(A1) |
申请公布日期 |
2013.06.20 |
申请号 |
US201213707075 |
申请日期 |
2012.12.06 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD.;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE TAKERU;KOBAYASHI TOMOHIRO;HATAKEYAMA JUN;KATAYAMA KAZUHIRO;KINSHO TAKESHI |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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