In various embodiments, used sputtering targets are refurbished at least in part by maintaining a large obliquity angle (300) between the spray-deposition gun (320) and the depressed surface contour (330) of the target during spray deposition of the target material.
申请公布号
WO2013090516(A1)
申请公布日期
2013.06.20
申请号
WO2012US69401
申请日期
2012.12.13
申请人
H.C. STARCK INC.;MICHALUK, CHRISTOPHER;LOEWENTHAL, WILLIAM;ROZAK, GARY;ABOUAF, MARC;HOGAN, PATRICK;MILLER, STEVEN, A.
发明人
MICHALUK, CHRISTOPHER;LOEWENTHAL, WILLIAM;ROZAK, GARY;ABOUAF, MARC;HOGAN, PATRICK;MILLER, STEVEN, A.
