发明名称 |
Compound for photoacid generator, resist composition using the same, and pattern-forming method |
摘要 |
A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation. |
申请公布号 |
KR101277395(B1) |
申请公布日期 |
2013.06.20 |
申请号 |
KR20097018822 |
申请日期 |
2008.02.14 |
申请人 |
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发明人 |
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分类号 |
C07C309/27;C07C381/12;C08F20/24;G03F7/004 |
主分类号 |
C07C309/27 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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