发明名称 |
METHODS FOR SINGLE EXPOSURE - SELF-ALIGNED DOUBLE, TRIPLE, AND QUADRUPLE PATTERNING |
摘要 |
<p>A method including forming a pattern on a surface of a substrate, the pattern including one of discrete structures including at least one sidewall defining an oblique angle relative to the surface and discrete structures complemented with a material layer therebetween, the material layer including a volume modified into distinct regions separated by at least one oblique angle relative to the surface; and defining circuit features on the substrate using the pattern, the features having a pitch less than a pitch of the pattern.</p> |
申请公布号 |
WO2013089727(A1) |
申请公布日期 |
2013.06.20 |
申请号 |
WO2011US65079 |
申请日期 |
2011.12.15 |
申请人 |
INTEL CORPORATION;CINNOR, FITIH, M.;WALLACE, CHARLES H. |
发明人 |
CINNOR, FITIH, M.;WALLACE, CHARLES H. |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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