| 摘要 |
PURPOSE: A substrate processing apparatus is provided to improve the durability of equipment by not installing an element in a side where the waste gas is emitted. CONSTITUTION: A first, second, third, and fourth transferring roller(191~194) are consecutively arranged from an inlet side of a processing chamber(140). The first, second, third, and fourth transferring roller transfer a substrate(10) which is taken into the processing chamber to an exit of the processing chamber. A plasma source unit sprays the linear plasma to an interval of the second transferring roller and the third transferring roller. A gap between the second transferring roller and the third transferring roller is bigger than a gap between the first transferring roller and the second transferring roller, and a gap between the third transferring roller and the fourth transferring roller.
|
