| 摘要 |
PURPOSE: A wafer block cleaning zig and a cleaning method using the same are provided to improve a cleaning effect and process efficiency by stably holding a wafer block in a rotation state. CONSTITUTION: A pair of fixing plates(111,112) is vertically arranged in regular intervals. A supporting unit(120) holds an exposed wafer block. The supporting unit includes a pair of middle support bars(121a,121b), a pair of lower support bars(122a.122b), and a pair of support plates(123,124). A fixing unit(130) includes a pair of bars(131a,131b) for holding the wafer block between the fixing plates, and a pair of fixing stands(132,133). The fixing stands move along the fixing bars.
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