发明名称 Metrology for preparation of thin samples
摘要 A method is provided of reducing the thickness of a region of a target sample. Reference data is obtained that is representative of x-rays generated by a particle beam being directed upon part of a reference sample under a first set of beam conditions. Under a second set of beam conditions the particle beam is directed upon the region of the target sample. The resultant x-rays are monitored as monitored data. Output data are then calculated based upon the reference and the monitored data. Material is then removed from the region, so as to reduce its thickness, in accordance with the output data.
申请公布号 GB201308436(D0) 申请公布日期 2013.06.19
申请号 GB20130008436 申请日期 2013.05.10
申请人 OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED 发明人
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