| 摘要 |
A vacuum processing apparatus is provided to improve the vacuum processing efficiency and to minimize thickness of a main body of a chamber by preventing a substrate supporter from being influenced by deformation of the main body of the chamber. A chamber main body(101) includes a shielded process space to perform a vacuum process, wherein an entrance is formed by penetrating the main body to communicate with outside. A substrate supporter(200) is installed within the chamber to support a substrate for performing the vacuum process. A plurality of fixing supporters(310) are installed at a bottom surface of the chamber. A sealing part(370) connects the bottom surface of the chamber to the substrate supporter so as to prevent the substrate supporter from being influenced by deformation of the chamber main body, and to isolate the shielded process space from the entrance to connect an inner device with an outer device installed outside the chamber. |
